Contract Details
Title

Elementary School Nemilany - together to school. Czech Republic

Country
Language
English
Organization
Published Date
06.02.2024
Awarded Date
06.01.2015
Overview
Contract Award's Details : Elementary School Nemilany - together to school. statut?rn? mesto Olomouc 00299308 Horn? n?mest? Contact point(s): MmOl, odb. investic, odd. verejn?ch zak?zek For the attention of: Mgr. Miroslav Pizur 779 11 Olomouc CZECH REPUBLIC Telephone: +420 588488729 E-mail: miroslav.p Laboratory Equipment lithographic CEITEC University. Contract award: Laboratory Equipment lithographic CEITEC University. The subject of this contract is the newly built lithographic equipment laboratory CEITEC University. The contract will be divided into two parts, the contractor may submit a bid on any part of the contract or contracts on both parts simultaneously: - Part 1 of the contract - Chemical bench. The object of this contract is to supply seven types of specialized chemical benches especially for semiconductor technology processes, processes of electron and optical lithography, chemical cleaning and etching of sharing laboratories Preparation and characterization of nanostructures. The basic requirement for all chemical bench is total compatibility with chemical processes defined authority, their installation and connection to a technical background (demineralised water, distribution of nitrogen and compressed air, chemicals and sewage waste). Chemical bench will be incorporated into the laboratory with a cleanliness class 100 and therefore the required full material compatibility with the environment, - Part 2 orders - Set lithography equipment line. The object of this contract is a complete system for optical photolithography, the basic idea is to sponsor construction of integrated (photo) lithographic line to the newly constructed technical-scientific laboratories CEITEC University. Required complete system for optical photolithography comprises a mask lithography, which will be automated for routine applications - alignment (mask - Chuck leveling) and alignment (mask - Substrate alignment) lithographic mask substrate and exposure; device must allow a combination of successive exposures through different lithographic masks on one substrate including the alignment of the upper and lower sides to defined marks. Furthermore, the device is required for applying and developing mainly organic layers for electron and optical lithography. This equipment must include a user programmable automated application system and developing lithographic resists for substrates up to 8 . This equipment is a comprehensive system of dispensers and containers for resists and developers, waste management, control software, will be controlled using the touch screen, with predefined coating processes and developing. The equipment will be placed on stand-alone frame. Another part of a complete system for optical photolithography is lithographic table in order to prepare substrates especially for electron or optical lithography. The basic processes are baking resist, resist coating and coating adhesion interlayers for the purpose of application of positive and negative resists for electron and optical lithography, at least compatibility with PMMA, SU-x, x-AZ eg. 495 A8 PMMA, SU 8 2000.5, S1813, AZ5214e , Sigma Aldrich KIT, HSQ. Detailed specification of requirements for equipment is given in section 3.1 a Czech Republic Contract value : See in details Contractors : E.PROXIMA, S.R.O., See in details 07/01/2015 07/04/2015 9530748 07/01/2015 Vysok? ucen? technick? v Brne 00216305 Anton?nsk? 548/1 Contact point(s): VUT v Brne, STI, Technick? 10, 616 00 Brno For the attention of: Ing. Vera Lyckov? 602 00 Brno CZECH REPUBLIC Telephone: +420 541146864 E-mail: vera.lyc Address : Czech Republic Czech Republic Contract Awards Czech Republic 4253-2015 See in details 07/04/2015 See in details
NAICS
Power Electric Power Transmission Paint Construction Scenic and Sightseeing Transportation Coating Machinery Colleges Colleges Agriculture Colleges Coating Photographic Film Environment Management Water Construction Process
CPVS
Work benches Compresses Laboratory, optical and precision equipments (excl. glasses) Other containers System, storage and content management software package Control, safety, signalling and light equipment Screens Sections Construction, foundation and surface works for highways, roads Control, safety or signalling equipment for inland waterways Frames Wells construction work Sewage work Control, safety or signalling equipment for parking facilities Construction work Command, control, communication systems Control, safety or signalling equipment for port installations Command, control, communication and computer systems Dispensers System, storage and content management software development services Large containers Semiconductors Laboratory, hygienic or pharmaceutical glassware Sewage, refuse, cleaning and environmental services Pressure-reducing, control, check or safety valves Masks, fins or snorkels Tables Control, safety or signalling equipment for roads Goods used in construction Benches Architectural, construction, engineering and inspection services Nitrogen Control, safety or signalling equipment for airports Tables, cupboards, desk and bookcases
UNSPSC
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Regions
Europe
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Civil Works Building Environment and Pollution-Recycling Automobiles and Auto Parts Supply Minerals and Mining Postal and Courier Services Infrastructure Printing and Publishing Defence and Security Technology Hardware and Equipment Construction Energy-Power and Electrical Computer Hardwares and Consumables Steel Laboratory Equipment and Services Building Material Marine
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