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AllResist Resist PMMA per Bosi su INAF GLOSS CUP C33C23000620005 CIG B4351880FB
Organization:
*****
Language:
Italian
Country:
Italy
Deadline:
19.11.2024
AFFIDAMENTO DIRETTO DELLA FORNITURA DI PRODOTTI CHIMICI PER NANOFRAZOR E PROCESSI DI LIFT-OFF
Organization:
*****
Language:
Italian
Country:
Italy
Deadline:
27.10.2024
FORNITURA DI RESIST PER PROCESSI DI LITOGRAFIA A FASCIO ELETTRONICO
Organization:
*****
Language:
Italian
Country:
Italy
Deadline:
16.05.2024
RIVESTIMENTO PROTETTIVO LIQUIDO AR-PC 5090.02. CIG: ZF536399EE CUP: B54I20001080006
Organization:
*****
Language:
Italian
Country:
Italy
Deadline:
02.05.2022
E-BEAM RESIST E SVILUPPATORI PER LA LITOGRAFIA ELETTRONICA (EBL)
Organization:
*****
Language:
Italian
Country:
Italy
Deadline:
08.11.2021
AR-P 679.04 E-Beam Resist PMMA 950K for nanostructuring CIG Z41310116F B84G14000070005
Organization:
*****
Language:
Italian
Country:
Italy
Deadline:
20.03.2021
Negative EB Resist, developer for resist and remover photoresist
Organization:
*****
Language:
Italian
Country:
Italy
Deadline:
16.02.2021
Fornitura di prodotti chimici per processi litografici presso il laboratorio clean room del CNR-IMM...
Organization:
*****
Language:
Italian
Country:
Italy
Deadline:
09.12.2019