Tender Details
Title
System for Electron Beam Lithography Tender Notice International Competitive Bidding
Country
Language
English
Organization
Published Date
26.06.2024
Deadline Date
23.07.2024
Overview
System for Electron Beam Lithography The subject of the public contract is the supply of a system for creating arbitrary shapes with a resolution of at least 20 nm using a focused beam of electrons on a surface covered with an electron-sensitive film. The system must further allow selective removal of exposed or unexposed areas of the surface. System INSTITUTE OF PHYSICS OF THE ACADEMY OF SCIENCES OF THE CZECH REPUBLIC, V. V. I. Address : Na Slovance 1999 2 Town : Prague NUTS-Code : CZ064 - South Moravian Region Postal Code : 18200 kafkav@fzu.cz Tender Notice International Competitive Bidding 378163-2024 Czech Republic GT-103222151
NAICS
Justice Justice Other Justice International Other Justice
CPVS
System, storage and content management software package Film Lavatory seats, covers, bowls and cisterns System, storage and content management software development services Beams Shapes Postal orders
UNSPSC
Beams Surface
Regions
Europe
Sectors
Supply Postal and Courier Services Law and Legal Printing and Publishing Defence and Security Construction Energy-Power and Electrical Computer Hardwares and Consumables Steel
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